Building the New Generation in
Thin Film Deposition Systems & Components
for R&D and Industrial Applications


Accelerating Materials Breakthroughs

Our goal is to enable researchers and companies with the tools to accelerate their next materials breakthroughs while reducing the time and resources spent in R & D as well as improving process times in production.



We offer unique systems, innovative components, smart designs, and the combination of different deposition techniques.

THIN FILM ENGINEERING FOR R & D

Advanced Materials with Tailored Properties

We exploit the advantages of Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD) and combine them in the first compact cluster system, THE SC-1 ❯

ALD SOLUTIONS FOR INDUSTRY

Faster process times

We are developing the new generation of industrial ALD systems, from a 2D wafer scale to large and complex 3D objects, aimed to deliver faster process times. CUSTOM SOLUTIONS ❯


The SC-1
The first compact cluster system for R & D

The SC-1 is an innovative patent-pending cluster system:

Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD)

No need for mechanical arms or antechambers

Modular, flexible and customizable system


LEARN MORE ABOUT THE SC-1 ❯



TEMPERATURE GRADIENT STAGE

The TGS is an off-the-shelf substrate holder for 2D wafers:

Temperature gradient from 500 °C  to 30 °C.

Homogeneous temperatures of up to 400 °C

Save time and resources in deposition and characterization


LEARN MORE ABOUT OUR COMPONENTS ❯


THE TEAM

Dr. Carlos Guerra

CEO & Co-founder

Kevin Lücke

CTO

Bryan Dousse

Lead Project Engineer

Jérémie Bérard

Lead Project Manager

Laszlo Petho

CSO & Co-founder

Gabriela A. Sanchez

COO

OUR SUPPORTERS