Building the New Generation in
Thin Film Deposition Systems & Components
for R&D and Industrial Applications
Accelerating Materials Breakthroughs
Our goal is to enable researchers and companies with the tools to accelerate their next materials breakthroughs while reducing the time and resources spent in R & D as well as improving process times in production.
We offer unique systems, innovative components, smart designs, and the combination of different deposition techniques.
THIN FILM ENGINEERING FOR R & D
Advanced Materials with Tailored Properties
We exploit the advantages of Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD) and combine them in the first compact cluster system, THE SC-1 ❯
ALD SOLUTIONS FOR INDUSTRY
Faster process times
We are developing the new generation of industrial ALD systems, from a 2D wafer scale to large and complex 3D objects, aimed to deliver faster process times. CUSTOM SOLUTIONS ❯
The SC-1
The first compact cluster system for R & D
The SC-1 is an innovative patent-pending cluster system:
・ Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD)
・ No need for mechanical arms or antechambers
・ Modular, flexible and customizable system
TEMPERATURE GRADIENT STAGE
The TGS is an off-the-shelf substrate holder for 2D wafers:
・ Temperature gradient from 500 °C to 30 °C.
・ Homogeneous temperatures of up to 400 °C
・ Save time and resources in deposition and characterization
THE TEAM
Dr. Carlos Guerra
CEO & Co-founder
Kevin Lücke
CTO
Bryan Dousse
Lead Project Engineer
Jérémie Bérard
Lead Project Manager
Laszlo Petho
CSO & Co-founder
Gabriela A. Sanchez
COO
OUR SUPPORTERS
