Building the New Generation in
Thin Film Deposition Systems & Components
for R&D and Industrial Applications
Accelerating Materials Breakthroughs
Our goal is to enable researchers and companies with the tools to accelerate their next materials breakthroughs while reducing the time and resources spent in R & D as well as improving process times in production.
We offer unique systems, innovative components, smart designs, and the combination of different deposition techniques.
THIN FILM ENGINEERING FOR R & D
Advanced Materials with Tailored Properties
ALD SOLUTIONS FOR INDUSTRY
Faster process times
The first compact cluster system for R & D
TEMPERATURE GRADIENT STAGE
The TGS is an off-the-shelf substrate holder for 2D wafers:
・ Temperature gradient from 500 °C to 30 °C.
・ Homogeneous temperatures of up to 400 °C
・ Save time and resources in deposition and characterization